Experts Interpret Hu Jintao's Speech at the Party School: Key Sector Reform Is Promising

On the 3rd, General Secretary of the CPC Central Committee Hu Jintao emphasized at the Central Party School the eight "accelerations" of "transforming economic development mode" and demanding "working hard and seeing results." According to Hong Kong's Wen Wei Po report, Zhang Jianqiao, an expert from the Institute of Economics of the Chinese Academy of Social Sciences, pointed out that the speech showed the great determination of the central government to promote adjustment and reform. Therefore, it can be expected that the long-term delay in key areas of reform is expected to make a breakthrough.

Zhang Jianqiao said that after China’s successful “guarantee eight” in 2009, the economics community reached a consensus that the policy focus should shift from maintaining growth to adjusting structure. Only by adjusting the structure can we improve the quality of growth and ensure long-term sustainable growth. However, the biggest problem since the implementation of the policy of maintaining growth is precisely that the problem of imbalanced economic structure has become more serious, which is reflected in the further deterioration of the contradiction between excessive investment and insufficient consumption.

He pointed out that as General Secretary Hu Jintao said, the current transformation of economic growth mode is urgent, but without some advances in key areas, it is difficult to make substantial progress in restructuring and transforming economic growth. Therefore, the next step is to work hard to deepen reform. First, through resource reforms such as resources and energy, production factors, and capital, resources will be relocated, and the current situation of resource allocation distortion will be changed. Later, reforms in the financial sector, fiscal and taxation systems, and land systems will need to be pushed forward.  

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	Standard precision	High-precision
Dimension Tolerance	φ5-250mm+0/-0.2	φ3-350mm+0/-0.2
Thickness Tolerance	1-50mm+/-0.1	1-50mm
Parallelism	1 arc minute	10 arc seconds
Surface Quality	60/40	20/10
Flatness	N<λ/2@633nm(at 50mm)	N<λ/10@633nm(at 50mm)
Clear Aperture	>90%	>95%
Chamfer	Protected <0.5mmx45deg	Protected <0.5mmx45deg

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